IIT School
A three-day school will cover fundamental and practical aspects of ion implantation and annealing in research and production environments. The individual topics will be lectured by a dozen world-class experts from industry and academia. An approx. 600-page hardcover book will be handed out to the participants.
IIT School Topics
- History of Integrated Circuits and Ion Implantation
- Ion Implanter Equipment - I: Ion Sources, Beams, and Space Charge Control
- Ion Implanter Equipment - II: Ion Transport and Beam Line Control
- Commercial Equipment Overview, their Specialties, and Applications
- Annealing Equipment Hardware
- Metrology for Ion Implantation and Annealing
- Contamination and Ion Beam Purity
- Safety Considerations for Ion Implantation, RTP, and Furnace
- Defects in Si, SiC, and its Annealing
- Diffusion and Activation of Dopants; The Science of Annealing Wafers
- Ion Channeling in Si and SiC
- Process Integration and Applications for Logic, Memory, and Image Sensors
- Process Integration and Applications for Power Devices According to Various Wafer Substrates
- Future in Process Integration