IIT2026 Ion Implantation & Annealing School

A three-day school will cover fundamental and practical aspects of ion implantation and annealing in research and production environments. The individual topics will be lectured by a dozen world-class experts from industry and academia. An approx. 600-page hardcover book will be handed out to the participants.

Topics & Teachers

Chapter 1: History of Integrated Circuits and Ion Implantation – Michael. I. Current
Chapter 2: Ion Sources, Beams & Space Charge Control – Thomas. N. Horsky and Hiro Ito
Chapter 3: Ion transport and Implantation control – Bo Vanderberg and Edward Eisner
Chapter 4: Commercial Ion Implantation Systems – Michael I. Current, Leonard Rubin and Wai-Ming Tam
Chapter 5: Annealing Equipment Hardware: New Advancement in Ion Implantation Annealing for Si, Ge, SiC and GaN – Wilfried Lerch and Juergen Niess
Chapter 6: Metrology for Ion Implantation and Annealing Process Control – Mathias Rommel, Nikolay Cherkashin, Volker Häublein, Robert Hillard, Peter Horvath, Wilfried Lerch, Chiao Yu Liu, Paula Peres, Katherine P. Rice, Tamás Sipőcz, and Dénes Zoltán Ullrich
Chapter 7: Ion Beam Purity and Elemental Contamination – Michael I. Current, Volker Häublein, Heiner Ryssel, and David A. Kirkwood
Chapter 8: Safety Considerations for Ion Implanter, RTP, and Furnace – Ewald Wiltsche, Werner Schustereder, Silke Hamm, and Jürgen Niess
Chapter 9: Defects in Si, Ge, GaN, GaAs and their Annealing – Kevin S. Jones
Chapter 10: Diffusion and Activation of Dopants: The Science of Annealing Wafers – Wilfried Lerch and Peter Pichler
Chapter 11: Ion Channeling in Si and SiC – Sean Jones, Leonard Rubin, Michael Current, Werner Schustereder, and Volker Häublein
Chapter 12: Process Integration and Application for Logic, Memory and Image Sensors – Leonhard Rubin
Chapter 13: Ion Implantation Challenges for Power Devices and Wide Band Gap Materials – Werner Schustereder
Chapter 14: CMOS Scaling to Sub nm Stacked Nanosheet CFETs – Santosh Kurinec, Aravind Kolli, and Austin Smith