IIT School Program
16 September 2026
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17 September 2026
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18 September 2026
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19 September 2026
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| 08:30–09:15 | Registration / Welcome | 08:30–09:30 | Chapter 6: Metrology for Ion Implantation and Annealing Process Control Matthias Rommel |
08:30–09:30 | Chapter 12: Process Integration and Application for Logic, Memory and Image Sensors Leonard Rubin |
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| 09:15–09:30 | Opening | ||||||
| 09:30–10:30 | Chapter 1: History of Integrated Circuits & Ion Implantation Heiner Ryssel |
09:30–10:30 | Chapter 7: Ion Beam Purity and Elemental Contamination David Kirkwood |
09:30–10:30 | Chapter 13: Ion Implantation Challenges for Power Devices and Wide Band Gap Materials Werner Schustereder |
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| 10:30–11:00 | Coffee Break | 10:30–11:00 | Coffee Break | 10:30–11:00 | Coffee Break | ||
| 11:00–12:00 | Chapter 2: Ion Sources, Beams & Space Charge Control Tom Horsky |
11:00–12:00 | Chapter 8: Safety Considerations for Ion Implanter, RTP, and Furnace Ewald Wiltsche, Silke Hamm |
11:00–12:00 | Chapter 14: CMOS Scaling to Sub nm Stacked Nanosheet CFETs Santosh Kurinec |
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| 12:00–13:00 | Chapter 3: Ion transport and Implantation control Bo Vanderberg |
12:00–13:00 | Chapter 9: Defect formation and annealing in Si and SiC Kevin S. Jones |
12:00 | Closing session | ||
| 13:00–13:45 | Lunch Break | 13:00–13:45 | Lunch Break | ||||
| 13:45–15:00 | Infineon Unlocked Tour | 13:45–15:00 | Infineon Unlocked Tour | ||||
| 15:00–16:00 | Chapter 4: Commercial Ion Implantation Systems Volker Häublein |
15:00–16:00 | Chapter 10: Diffusion and Activation of Dopants: The Science of Annealing Wafers Wilfried Lerch |
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| 16:00–17:00 | Chapter 5: Annealing Equipment Hardware: New Advancement in Ion Implantation Annealing for Si, Ge, SiC and GaN Wilfried Lerch |
16:00–17:00 | Chapter 11: Ion Channeling in Si and SiC Sean Jones |
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| 17:00–19:00 | Welcome reception | ||||||
Last update on 28 August 2026.
The program might be subject to necessary changes.